Image Trademark of Toppan Photomasks, Inc. Trademark Details

This trademark was registered on Tuesday, December 2, 2003 and is currently owned by Toppan Photomasks, Inc. under the registration number 2788846 . This mark is dead with a status of Cancelled - Section 8. The last case file activity for this mark occured 13 years ago on Saturday, July 10, 2010, according to the United State Patent & Trademark Office

Status	Dead Registered 710 — Cancelled - Section 8

Current Owner

Toppan Photomasks, Inc. of Round Rock, TX

View all trademarks for Toppan Photomasks, Inc.

Other Trademarks for Toppan Photomasks, Inc.

Previous Owners

Dupont Photomasks Inc of Round Rock, TX

View all trademarks for Dupont Photomasks Inc

Other Trademarks for Dupont Photomasks Inc

Serial Number	78179548
Registration Number	2788846
Status Date	Saturday, July 10, 2010
Filing Date	Saturday, July 10, 2010
Registration Date	Tuesday, December 2, 2003
Attorney	Dwayne K. Goetzel

Correspondent

DWAYNE K. GOETZEL
MEYERTONS HOOD KIVLIN KOWERT ET AL
P.O. BOX 398
AUSTIN TX 78767-0398

Case File Statements

Description of Mark	The mark consists of a beam of light shining through layers of photomasks.
Goods & Services	Custom manufacturing at the order and specification of others, namely, photoresist and etch services, for the manufacture of photomasks; custom manufacturing at the order and specification of others, namely, photoresist and etch services, for the optical transfer of integrated circuit images onto semiconductor wafers; custom manufacturing at the order and specification of others, namely, photoresist and etch services, for altering and blocking light as applied to photomasks; photolithography for the transfer of integrated circuit images onto various substrates, namely, semiconductor wafers, GaAs wafers, III-V compound wafers, quartz, and glass

The mark consists of a beam of light shining through layers of photomasks.

Custom manufacturing at the order and specification of others, namely, photoresist and etch services, for the manufacture of photomasks; custom manufacturing at the order and specification of others, namely, photoresist and etch services, for the optical transfer of integrated circuit images onto semiconductor wafers; custom manufacturing at the order and specification of others, namely, photoresist and etch services, for altering and blocking light as applied to photomasks; photolithography for the transfer of integrated circuit images onto various substrates, namely, semiconductor wafers, GaAs wafers, III-V compound wafers, quartz, and glass

Classifications

International Class Codes	040 — Class 40 includes mainly services not included in other classes, rendered by the mechanical or chemical processing or transformation of objects or inorganic or organic substances. For the purposes of classification, the mark is considered a service mark only in cases where processing or transformation is effected for the account of another person. A mark is considered a trade mark in all cases where the substance or object is marketed by the person who processed or transformed it.
U.S. Class Codes	100, 103, 106
Status	2 — Sec. 8 – Entire Registration
Status Date	Saturday, July 10, 2010
First Use Anywhere	Monday, December 3, 2001
First Use In Commerce	Monday, July 22, 2002
Primary Code	040

Trademark Timeline

Dec 03 2001

First use anywhere for the mark
Jul 22 2002

First use in commerce for the mark
Oct 29 2002

Trademark application filed with USPTO
Feb 07 2003

Paper Received
Apr 04 2003

Non-Final Action E-Mailed
Apr 04 2003

Assigned To Examiner
Jun 10 2003

Correspondence Received In Law Office
Jun 10 2003

Paper Received
Jul 10 2003

Approved For Pub - Principal Register
Aug 20 2003

Notice of Publication
Sep 09 2003

Published For Opposition
Dec 02 2003

Registered-Principal Register
Dec 02 2003

Trademark officially registered with the USPTO
Jul 10 2010

Cancelled Sec. 8 (6-Yr)