Continuous Lithography Trademark Details
Word Mark | Continuous Lithography |
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Status | Dead 602 — Abandoned-Failure to Respond or Late Response |
Current Owner
Serial Number | 76287665 |
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Status Date | Friday, February 21, 2003 |
Filing Date | Friday, February 21, 2003 |
Attorney | Allston L. Jones |
Correspondent
ALLSTON L. JONES
PETERS, VERNY, JONES & BIKSA, LLP
385 SHERMAN AVE STE 6
PALO ALTO CA 94306-1840
PETERS, VERNY, JONES & BIKSA, LLP
385 SHERMAN AVE STE 6
PALO ALTO CA 94306-1840
Case File Statements
Disclaimer with Predetermined Text | "Lithography" |
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Goods & Services | Heat treating, cleaning, etching, implanting and leveling machines, and replacement parts thereof, for use in the production of semiconductors; special tooling for the aforesaid goods; and manuals and software sold as a unit with the aforesaid goods |
Goods & Services | Stepper, photolithographic and implanting machines for producing images, and printing or implanting images on wafers and other substrates; electron-beam columns and systems; reticles and masks wherein said reticles and masks contain the pattern to be printed on said semiconductor wafer and other substrates, illumination, inspection and measurement apparatus, specialized optical lenses, transport stages for wafers, retides and masks, wafer index tooling, illumination, inspection and measurement apparatus, special tooling, software and manuals all for the aforesaid goods; all for use in manufacturing semiconductor wafers and other substrates |
Goods & Services | Operation, instruction, maintenance, repair and training manuals and workbooks, and printed forms, all for use with stepper, photolithographic, illumination, inspection and measurement apparatus, heat treating, cleaning, etching, implanting and leveling machines, electron-beam columns and systems, reticles and masks, specialized optical lenses, wafer, reticle and mask transport stages and wafer index tooling for use in manufacturing semiconductor wafers and other substrates |
Goods & Services | Repair and Maintenance Services for Stepper, Photolithographic, Illumination, Inspection and Measurement Apparatus, Heat Treating, Cleaning, Etching, Implanting and Leveling Machines, Electron-Beam Columns and Systems, Reticles and Masks, Specialized Optical Lenses, Wafer, Reticle and Mask Transport Stages and Wafer Index Tooling for Use in Manufacturing Semiconductor Wafers and Other Substrates |
Goods & Services | Educational and Training Services, Namely Conducting Courses in the Use, Operation, Maintenance and Repair of Stepper, Photolithographic, Illumination, Inspection and Measurement Apparatus, Heat Treating, Cleaning, Etching, Implanting and Leveling Machines, Electron-Beam Columns and Systems, Reticles and Masks, Specialized Optical Lenses, Wafer, Reticle and Mask Transport Stages and Wafer Index Tooling for Use in Manufacturing Semiconductor Wafers and Other Substrates for Manufacturing Semiconductor Wafers and Other Substrates; and Distribution of Instructional Course Materials in Connection Therewith, |
Pseudo Mark | Continuous Lithography |
Classifications
International Class Codes |
007
|
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U.S. Class Codes | 013, 019, 021, 023, 031, 034, 035 |
Status | 6 — Active |
Status Date | Tuesday, July 31, 2001 |
Primary Code | 007 |
International Class Codes |
009
|
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U.S. Class Codes | 021, 023, 026, 036, 038 |
Status | 6 — Active |
Status Date | Tuesday, July 31, 2001 |
Primary Code | 009 |
International Class Codes |
016
|
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U.S. Class Codes | 002, 005, 022, 023, 029, 037, 038, 050 |
Status | 6 — Active |
Status Date | Tuesday, July 31, 2001 |
Primary Code | 016 |
International Class Codes |
037
|
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U.S. Class Codes | 100, 103, 106 |
Status | 6 — Active |
Status Date | Tuesday, July 31, 2001 |
Primary Code | 037 |
International Class Codes |
041
|
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U.S. Class Codes | 100, 101, 107 |
Status | 6 — Active |
Status Date | Tuesday, July 31, 2001 |
Primary Code | 041 |
Trademark Timeline
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Jul 19 2001Trademark application filed with USPTO
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Aug 31 2001Assigned To Examiner
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Sep 10 2001Non-Final Action Mailed
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Mar 11 2002Correspondence Received In Law Office
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Mar 11 2002Paper Received
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Jun 26 2002Final Refusal Mailed
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Feb 21 2003Abandonment - Failure To Respond Or Late Response