Clean W Trademark Details

Clean W was registered on Tuesday, March 14, 2006 and is currently owned by Applied Materials, Inc. under the registration number 3068618 . This mark is dead with a status of Cancelled - Section 8. The last case file activity for this mark occured 11 years ago on Friday, October 19, 2012, according to the United State Patent & Trademark Office
Word Mark Clean W
Status Dead Registered 710 — Cancelled - Section 8

Current Owner

Applied Materials, Inc. of Santa Clara, CA

View all trademarks for Applied Materials, Inc.
Other Trademarks for Applied Materials, Inc.
Serial Number 76481968
Registration Number 3068618
Status Date Friday, October 19, 2012
Filing Date Friday, October 19, 2012
Registration Date Tuesday, March 14, 2006
Attorney Robert W. Mulcahy

Correspondent

ROBERT W. MULCAHY
APPLIED MATERIALS, INC.
2881 SCOTT BOULEVARD, M/S 2061
SANTA CLARA, CA 95054

Case File Statements

Goods & Services Semiconductor wafer processing machines and components, namely, epitaxial reactors, chemical vapor deposition reactors, physical vapor deposition reactors, plasma etchers, ion implanters, and chemical mechanical polishers; all for the processing and production of semiconductor substrates, thin films, silicon chips and silicon wafers

Classifications

International Class Codes
007 — Class 7 includes mainly machines, machine tools, motors and engines.
U.S. Class Codes 013, 019, 021, 023, 031, 034, 035
Status 2 — Sec. 8 – Entire Registration
Status Date Friday, October 19, 2012
First Use Anywhere Wednesday, November 30, 2005
First Use In Commerce Wednesday, November 30, 2005
Primary Code 007

You must be signed in to print.

Once signed in, look for the PDF button.