Ilb Trademark Details
Word Mark | Ilb |
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Status | Dead 602 — Abandoned-Failure to Respond or Late Response |
Current Owner
Applied Materials, Inc. of Santa Clara, CA
View all trademarks for Applied Materials, Inc.Serial Number | 76225858 |
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Status Date | Tuesday, February 8, 2005 |
Filing Date | Tuesday, February 8, 2005 |
Attorney | Robert W. Mulcahy |
Correspondent
ROBERT W. MULCAHY
ATTORNEY AT LAW
2881 SCOTT BOULEVARD, M/S 2061
SANTA CLARA, CA 95054
ATTORNEY AT LAW
2881 SCOTT BOULEVARD, M/S 2061
SANTA CLARA, CA 95054
Case File Statements
Goods & Services | Equipment and machines, namely, epitaxial reactors, chemical vapor deposition reactors, physical vapor deposition reactors, plasma etchers, and ion implanters for the processing and production of semiconductor substrates, thin films, silicon chips and wafers including polishing, cleaning and process monitoring equipment |
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Classifications
International Class Codes |
009
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U.S. Class Codes | 021, 023, 026, 036, 038 |
Status | 6 — Active |
Status Date | Wednesday, March 28, 2001 |
First Use Anywhere | Wednesday, March 31, 2004 |
First Use In Commerce | Wednesday, March 31, 2004 |
Primary Code | 009 |
Trademark Timeline
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Mar 14 2001Trademark application filed with USPTO
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Jul 09 2001Assigned To Examiner
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Jul 18 2001Non-Final Action Mailed
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Jan 11 2002Correspondence Received In Law Office
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Jun 11 2002Approved For Pub - Principal Register
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Sep 04 2002Notice of Publication
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Sep 24 2002Published For Opposition
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Dec 17 2002Noa Mailed - Sou Required From Applicant
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Jun 11 2003Teas Extension Received
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Jun 12 2003Extension 1 Filed
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Jun 24 2003Extension 1 Granted
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Dec 11 2003Extension 2 Filed
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Dec 11 2003Teas Extension Received
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Dec 29 2003Extension 2 Granted
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Mar 31 2004First use anywhere for the mark
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Mar 31 2004First use in commerce for the mark
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Apr 26 2004Assigned To Examiner
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Jun 01 2004Use Amendment Filed
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Jun 01 2004Paper Received
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Jun 11 2004Case File In Ticrs
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Jun 16 2004Statement of Use Processing Complete
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Jul 12 2004Non-Final Action Mailed
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Feb 08 2005Abandonment Notice Mailed - Failure To Respond
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Feb 08 2005Abandonment - Failure To Respond Or Late Response